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350L large capacity Vertical Clean Oven350L large capacity Vertical Clean Oven
01

350L large capacity Vertical Clean Oven

2024-06-26

Clean ovens are used extensively in heat treatment or drying of semiconductor wafers, liquid crystals, disks and other components and devices requiring clean air conditions.

 

  • ● Class 100
  • ● 350L large capacity
  • ● Max. temperature 260℃
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Trolley, Roll in Truck in Industrial ...Trolley, Roll in Truck in Industrial ...
02

Trolley, Roll in Truck in Industrial ...

2024-06-26

Essential for general heating routines — from drying samples to curing microchips, a precise oven is one of the fundamental instruments every laboratory or workshop should have. GMS truck-in industrial ovens accommodate a variety of thermal processing applications up to 250℃. Our industrial truck-in ovens are ideally suited for drum heating, aging, core hardening, drying, preheating, curing, and component testing. With additional options, these truck-in industrial ovens can also be used for applications such as paint baking, plastic curing, varnish baking, sterilizing, and rubber,silica gel and epoxy curing. Trucks provide a quick and efficient way to load and unload products. Single, double, triple, and quadruple bay trucks are available to match any product load. 

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Ultra-High Temperature Inert (Anaerob...Ultra-High Temperature Inert (Anaerob...
03

Ultra-High Temperature Inert (Anaerob...

2024-06-26

Ultra-high temperature inert gas ovens are critical equipment in industries where high-temperature processing in an inert atmosphere is required, ensuring the quality and integrity of the materials being processed. It is applicable for atmosphere in inert gases such as Argon, Carbon Dioxide, Helium, and Nitrogen. The open-air heavy-gauge nichrome wire heater elements provide a robust heat source to up to 600 degrees. A unique dual-shell design allows for the circulation of coolant and ambient air around an inner chamber filled with inert gas, maintaining stable internal pressure and temperature. 

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High Temperature Vacuum Drying OvenHigh Temperature Vacuum Drying Oven
04

High Temperature Vacuum Drying Oven

2024-06-26
  • ● Vacuum drying to remove the moisture and solvent in the electrode materials.
  • ● Max. temperature 300℃/400℃ is optional
  • ● Operating vacuum range 101kPa -1Pa● Available in 3 sizes, large capacity
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Inert (Anaerobic) Gas Curing OvenInert (Anaerobic) Gas Curing Oven
05

Inert (Anaerobic) Gas Curing Oven

2024-06-26

Inert gas ovens are ideal for industrial oven applications that involve processing materials in a controlled atmosphere environment, including moisture drying, wafer drying, resin curing for semiconductor packaging, and aging of electronic components and devices.

● 1 chamber or 2 chamber types (standalone control for each chamber)
● Max. 260℃
●O2 concentration below 50ppm

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Customized Automatic Industrial Conve...Customized Automatic Industrial Conve...
06

Customized Automatic Industrial Conve...

2024-06-26
  • ● Suitable for thermal treatment of products
  • ● Set at production line, the conveyor oven improved the production efficiency greatly
  • ● Fully automatic control
  • ● The conveyor speed is adjustable and be able to se multiple treatment process
  • ● Equipped with frequency converter, stake light, cylinder, etc..
  • ● Automatic load and unload system to connect with upstream and downstream equipment
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High Vacuum Storage CabinetHigh Vacuum Storage Cabinet
07

High Vacuum Storage Cabinet

2024-06-26

The 9 chambers are independently controlled and share one set of vacuum system. It is suitable for all kinds of metal materials, anaerobicanaerobic, chemical raw materials, precious metals, metal powder and other solid,powder, paste, liquid, electronic products

 

  • ● 9-Chambers standalone control
  • ● Temporarily store products during the production process of electronic devices, optoelectronic devices, semiconductor chips and other devices to prevent oxidation
  • ● Min.50 to 5*10-5Pa vacuum
  • ● Barcode scanner to store product information
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Ultra-High Temperature Inert (Anaerob...Ultra-High Temperature Inert (Anaerob...
08

Ultra-High Temperature Inert (Anaerob...

2024-06-06

Suitable for curing semiconductor wafers (photoresist PI, PBO, BCB curing), glass substrate baking, and high-precision annealing treatment, etc. 

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