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High Temperature Vacuum Drying OvenHigh Temperature Vacuum Drying Oven
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High Temperature Vacuum Drying Oven

2024-06-26

Large vacuum drying oven designed for all kinds of vacuum drying purpose.

  • ● Max. temperature 250℃
  • ● Operating vacuum range 101kPa -0.1kPa

This oven is ideal for removing residual water, solvents or other volatile compounds from temperature-sensitive products. Vacuum pump will be installed in the downside of the oven to save installation space with quick connection flange piping. This type of oven is widely used in labs, semiconductor, MEMS, and electronic area.

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Customized Automatic Industrial Conve...Customized Automatic Industrial Conve...
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Customized Automatic Industrial Conve...

2024-06-26
  • ● Suitable for thermal treatment of products
  • ● Set at production line, the conveyor oven improved the production efficiency greatly
  • ● Fully automatic control
  • ● The conveyor speed is adjustable and be able to se multiple treatment process
  • ● Equipped with frequency converter, stake light, cylinder, etc..
  • ● Automatic load and unload system to connect with upstream and downstream equipment
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High Vacuum Storage CabinetHigh Vacuum Storage Cabinet
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High Vacuum Storage Cabinet

2024-06-26

The 9 chambers are independently controlled and share one set of vacuum system. It is suitable for all kinds of metal materials, anaerobicanaerobic, chemical raw materials, precious metals, metal powder and other solid,powder, paste, liquid, electronic products

 

  • ● 9-Chambers standalone control
  • ● Temporarily store products during the production process of electronic devices, optoelectronic devices, semiconductor chips and other devices to prevent oxidation
  • ● Min.50 to 5*10-5Pa vacuum
  • ● Barcode scanner to store product information
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PC Series 2/4/6 Chamber Curing OvenPC Series 2/4/6 Chamber Curing Oven
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PC Series 2/4/6 Chamber Curing Oven

2024-06-26

Suitable for semiconductor packaging program segment or testing in lab, for resin curing.

Multi-chamber oven utilizes a high-volume horizontal air recirculation system which maximizes temperature uniformity and performance.

 

  • ● Available for 2/3/4/6 chamber combination (standalone control for each chamber)
  • ● Saving the installation space
  • ● Horizontal convection
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Stainless Steel Clean Workshop Forced...Stainless Steel Clean Workshop Forced...
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Stainless Steel Clean Workshop Forced...

2024-06-26

GMS stainless steel industrial ovens accommodate a variety of thermal processing applications up to 200℃. Industrial ovens are ideally suited for drum heating, aging, core hardening, drying, preheating, curing, and component testing.

 

  • ● Stainless steel material to suite clean workshop or corrosive environment
  • ● Max. Temp. 200°C
  • ● Forced convection type
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Plasma Surface Treatment MachinePlasma Surface Treatment Machine
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Plasma Surface Treatment Machine

2024-06-26

The equipment is mainly composed of vacuum chamber and high frequency plasma power supply, vacuum system, inflation system, automatic control system and other parts. The basic principle of the work is in a vacuum state, the use of vacuum pumps to vacuum the studio to achieve a vacuum of 0.15-0.3 mbar, and then in the role of high-frequency generator, the gas will be ionized, the formation of plasma (the fourth state of matter), and then the use of plasma on the surface of the workpiece treatment.

 

  • ● Plasma system-handing machine
  • ● It can be used consistently in a manufacturing environment to clean and activate the surface of oddly shaped parts
  • ● Vacuum chamber
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Multi-type Precise Standard Industria...Multi-type Precise Standard Industria...
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Multi-type Precise Standard Industria...

2024-06-26

Essential for general heating routines — from drying samples to curing microchips, a precise oven is one of the fundamental instruments every laboratory or workshop should have. Available in three (3) standard sizes, these batch ovens are ideal for a variety of testing and industrial applications.

 

  • ● Widely applied in electronic industry to dry components
  • ● Max. Temp. 250°C
  • ● Available in 3 sizes, large capacity
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Ultra-High Temperature Inert (Anaerob...Ultra-High Temperature Inert (Anaerob...
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Ultra-High Temperature Inert (Anaerob...

2024-06-06

Suitable for curing semiconductor wafers (photoresist PI, PBO, BCB curing), glass substrate baking, and high-precision annealing treatment, etc. 

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