Semi-Automatic Rapid Thermal Processing Furnace

GZ-RTP-SM-12 is a semi-automatic vertical rapid thermal processing system. The system uses high intensity visible radiation to heat single 4-12 inch wafer/specimens for short process periods of time at precisely controlled temperatures. The process periods are typically 1-600 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber's cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.

1. High-intensity visible radiation halogen lamp heating for fast heating rates
2.Scattered IR light by special gold-plated Al chamber surface
3.Advanced software package with real time control technologies and many useful functions
4.Atmosphere or vacuum conditions are closable
5.Standard two gas lines, can be expanded to up to six gas lines with MFCs and shut-off valves
6.Cooling N2 (Or CDA) flows around the lamps and quartz isolation tube for fast cooling rates
7.Adopts the triple safety measures of door opening protection, thermostat opening authority protection and emergency stop protection to ensure the safety of the instrument.
8.Max. 12-inch wafer (300*300mm)

■ Rapid thermal annealing (RTA)
■ Oxide, Nitride Growth
■ Arsenitization Process
■ Implant annealing
■ Ohmic contact annealing (III-V and SiC)
■ Rapid Thermal Oxidation (RTO)
■ Rapid Thermal Nitridation (RTN)
■ Selenization (CIGS solar cells)
■ CVD of graphene and h-BN (hexagonal boron nitride)
■ Thermal annealing of polymers etc.