Vacuum Oven
Single-Wafer Automatic High Vacuum Oven
Small baking equipment, the maximum temperature of 250 ℃, using vacuum and nitrogen function combined to create oxygen-free, single bake a piece of wafer, suitable for small batch applications. Typical applications for this system include SOG annealing, copper annealing, aluminum annealing, low-k dielectric annealing and photoresist baking, drying and so on.
High Temperature Vacuum Oven
Vacuum ovens are ideal for removing residual water, solvents or other volatile compounds from temperature-sensitive products. The principle of operation, essentially, is to remove unwanted molecules by lowering the pressure in the oven (creating a vacuum). When the oven pressure reaches the desired vapor pressure of the contaminants, these contaminant molecules evaporate, turn to vapor, and are removed from all areas of the product. This drying is accomplished without the use of excessive heat. This makes vacuum drying suitable for materials that become damaged or are changed if exposed to high temperatures. Vacuum drying also minimizes the risk of scaling and the formation of oxidation residues. Vacuum high temperature ovens are typically used for products that are not heat resistant and are temperature sensitive. This type of oven is widely used in semiconductor, MEMS, electronic area.
Ultra High Vacuum Oven
High Vacuum Oven features directly heated shelves that can be programmed to heat up to 300oC. The high vacuum chamber can easily pump down to 10-6 Torr, pumped by a turbo pump which is backed by a dry scroll pump (with no oil back-streaming to worry about). While it is very fast to heat up, the cooldown process can be slow (several hours). To preserve the interior surfaces from excessive oxidation, the chamber can only be vented once the shelves have dropped below 100oC. The chamber is vented with nitrogen. A partial vent is possible if you need to allow your sample to cool completely down to ambient temperature while in a nitrogen atmosphere. There are two approximately 11" x 11" (280 mm x 280 mm) shelves, and two custom made aluminum trays. It can bake eight 4" wafers at a time. There are no windows, so light sensitive parts can be baked as long as they are wrapped in foil on the way into the chamber.
High Temperature Vacuum Drying Oven
- ● Vacuum drying to remove the moisture and solvent in the electrode materials.
- ● Max. temperature 300℃/400℃ is optional
- ● Operating vacuum range 101kPa -1Pa● Available in 3 sizes, large capacity
High Temperature Vacuum Drying Oven
Large vacuum drying oven designed for all kinds of vacuum drying purpose.
- ● Max. temperature 250℃
- ● Operating vacuum range 101kPa -0.1kPa
This oven is ideal for removing residual water, solvents or other volatile compounds from temperature-sensitive products. Vacuum pump will be installed in the downside of the oven to save installation space with quick connection flange piping. This type of oven is widely used in labs, semiconductor, MEMS, and electronic area.
High Vacuum Storage Cabinet
The 9 chambers are independently controlled and share one set of vacuum system. It is suitable for all kinds of metal materials, anaerobicanaerobic, chemical raw materials, precious metals, metal powder and other solid,powder, paste, liquid, electronic products
- ● 9-Chambers standalone control
- ● Temporarily store products during the production process of electronic devices, optoelectronic devices, semiconductor chips and other devices to prevent oxidation
- ● Min.50 to 5*10-5Pa vacuum
- ● Barcode scanner to store product information